Langdao Silex, a Chinese startup founded by alumni of Tsinghua University's Gas Discharge Plasma Laboratory, showed a prototype extreme ultraviolet light source at an industry fair in Shanghai. According to Tom's Hardware, the FlintNano LPP-OXXO uses laser-produced plasma and is rated at more than 15W of EUV output, with over 100 hours of continuous operation and 90% domestic components. The company says a commercial version is still three to five years away.
The output figure is difficult to compare directly with ASML's systems because Langdao appears to measure EUV power at the plasma rather than after the collector, where ASML measures it. At this level, the source resembles early EUV sources from Philips, Cymer, and Gigaphoton in the late 2000s and early 2010s. Modern EUV scanners have moved from 125–150W at intermediate focus to 250W-class sources and beyond; 15W is suited for experiments, not high-volume chip production.
The light source alone does not make an EUV scanner. Full lithography tools also require collection and illumination optics, precision multilayer mirrors, wafer and reticle stages, overlay control, and system integration. The report notes that Langdao's specifications cannot be independently verified because the prototype was not demonstrated operating. Still, even a partial EUV source could support research on photoresists, mask inspection, and EUV optics while complete scanners remain out of reach.