Researchers at Carl Zeiss SMT and ASML have published a technical paper describing Hyper-NA EUV lithography, a proposed system with a numerical aperture of at least 0.75. The paper, titled “Hyper-NA: a system with a numerical aperture of at least 0.75,” positions Hyper-NA as a path beyond the current 0.55-NA High-NA systems.
According to the paper, the work covers the optical architecture and resolution potential of such a system, along with reticle 3D effects and polarization. It also considers what would be required to extend the existing EUV ecosystem to support Hyper-NA.
Because this is a single paper from the two companies, the analysis represents their view rather than a broader industry consensus. The paper was published in the Journal of Micro/Nanopatterning, Materials, and Metrology in October 2026.